Goldman: China advanced chip supply to surge 46% CAGR by 2035
Synopsis
Key Takeaways
Goldman Sachs projects that China's supply of advanced semiconductor wafers — those manufactured at 7-nanometre and below process nodes — will expand at a compound annual growth rate of 46 per cent between 2025 and 2035, dramatically narrowing the country's chip self-sufficiency gap even as lithography equipment shortfalls keep full semiconductor independence out of reach.
The supply-demand gap narrows sharply
According to a Goldman Sachs report published on Monday, 24 August 2026, domestic advanced-node wafer supply is forecast to reach 410,000 wafers per month by 2035, against projected demand of 619,000 wafers per month. That would shrink the supply-demand deficit from 92 per cent in 2025 to 34 per cent by 2035 — a significant structural shift, though a gap that still leaves China reliant on external sources for a meaningful share of its advanced chip needs.
Domestic demand for advanced chips is itself expected to grow at 17 per cent annually over the same period, reflecting the accelerating buildout of artificial intelligence infrastructure, consumer electronics, and telecommunications across the country.
SMIC's expansion is the central driver
Semiconductor Manufacturing International Corp (SMIC), China's largest contract chipmaker, is the cornerstone of Goldman's projections. The bank's model assumes SMIC adds between 30,000 and 50,000 advanced-node wafers of monthly capacity each year from 2026 to 2031, followed by an additional 20,000 wafers per month annually through 2035.
Yield improvements are equally critical to the outlook. Goldman assumes production yields at SMIC rise from 23 per cent in 2026 to 50 per cent in 2030 and 75 per cent by 2035. By comparison, Taiwan Semiconductor Manufacturing Company (TSMC) — the world's leading foundry, which began mass-producing 7nm chips in 2018 — achieves yields that can exceed 90 per cent, depending on chip design and die size.
Why it matters: lithography remains the weak link
Despite the bullish supply trajectory, Goldman Sachs analysts flag lithography as the persistent bottleneck constraining full semiconductor independence. China's domestic lithography champion, Shanghai Micro Electronics Equipment Group (SMEE), has yet to match the extreme ultraviolet (EUV) capabilities of Netherlands-based ASML, the sole global supplier of the most advanced lithography systems. Washington's export controls have effectively blocked Beijing from accessing ASML's cutting-edge equipment.
The gap in lithography technology means that even as capacity and yields improve, the process nodes achievable without foreign equipment may remain a generation or more behind the global frontier, according to analysts.
The competitive backdrop
TSMC and its ecosystem partners continue to push process technology well beyond 7nm, with volume production at 3nm and development underway at 2nm and below. Huawei Technologies, which has emerged as a key domestic customer for SMIC's advanced nodes following its own blacklisting from US supply chains, is among the companies most exposed to whether China's foundry ramp materialises on schedule.
What's next
The pace of SMIC's capacity additions and the trajectory of domestic lithography development at SMEE will be the two variables most closely watched by industry observers over the next 18 to 24 months. Any acceleration in China's equipment self-sufficiency — or further tightening of US-led export controls — could materially shift Goldman's projections in either direction.